Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization › Research Explorer

Al₂O₃ thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

Research output: Contribution to journal › Article › peer-review

DOI

https://doi.org/10.1016/j.surfcoat.2018.12.065
Final published version

N. V. Gavrilov
A. S. Kamenetskikh
P. V. Trernikov
D. R. Emlin
A. V. Chukin
Yu S. Surkov

Original language	English
Pages (from-to)	117-124
Number of pages	8
Journal	Surface and Coatings Technology
Volume	359
DOIs	https://doi.org/10.1016/j.surfcoat.2018.12.065
Publication status	Published - 15 Feb 2019

WoS ResearchAreas Categories

Materials Science, Coatings & Films
Physics, Applied

Research areas

AlO coating, Ion assistance, Reactive thermal evaporation, α-AlO, HOLLOW-CATHODE, ALPHA-AL2O3 COATINGS, alpha-Al2O3, PERFORMANCE, LOW-TEMPERATURES, VACUUM-ARC, PLASMA, ALUMINA COATINGS, HARDNESS, Al2O3 coating, MAGNETRON SPUTTER-DEPOSITION, MICROSTRUCTURE

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

ID: 8541582