Standard

Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization. / Gavrilov, N. V.; Kamenetskikh, A. S.; Trernikov, P. V. et al.
In: Surface and Coatings Technology, Vol. 359, 15.02.2019, p. 117-124.

Research output: Contribution to journal › Article › peer-review

Harvard

Gavrilov, NV, Kamenetskikh, AS, Trernikov, PV, Emlin, DR, Chukin, AV & Surkov, YS 2019, 'Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization', Surface and Coatings Technology, vol. 359, pp. 117-124. https://doi.org/10.1016/j.surfcoat.2018.12.065

APA

Gavrilov, N. V., Kamenetskikh, A. S., Trernikov, P. V., Emlin, D. R., Chukin, A. V., & Surkov, Y. S. (2019). Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization. Surface and Coatings Technology, 359, 117-124. https://doi.org/10.1016/j.surfcoat.2018.12.065

Vancouver

Gavrilov NV, Kamenetskikh AS, Trernikov PV, Emlin DR, Chukin AV, Surkov YS. Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization. Surface and Coatings Technology. 2019 Feb 15;359:117-124. doi: 10.1016/j.surfcoat.2018.12.065

Author

Gavrilov, N. V. ; Kamenetskikh, A. S. ; Trernikov, P. V. et al. / Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization. In: Surface and Coatings Technology. 2019 ; Vol. 359. pp. 117-124.

BibTeX

@article{a07f0d7d516e4206b9953e4f61a4d192,
title = "Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization",
keywords = "AlO coating, Ion assistance, Reactive thermal evaporation, α-AlO, HOLLOW-CATHODE, ALPHA-AL2O3 COATINGS, alpha-Al2O3, PERFORMANCE, LOW-TEMPERATURES, VACUUM-ARC, PLASMA, ALUMINA COATINGS, HARDNESS, Al2O3 coating, MAGNETRON SPUTTER-DEPOSITION, MICROSTRUCTURE",
author = "Gavrilov, {N. V.} and Kamenetskikh, {A. S.} and Trernikov, {P. V.} and Emlin, {D. R.} and Chukin, {A. V.} and Surkov, {Yu S.}",
year = "2019",
month = feb,
day = "15",
doi = "10.1016/j.surfcoat.2018.12.065",
language = "English",
volume = "359",
pages = "117--124",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier BV",

}

RIS

TY - JOUR

T1 - Al2O3 thin films deposition by reactive evaporation of Al in anodic arc with high levels of metal ionization

AU - Gavrilov, N. V.

AU - Kamenetskikh, A. S.

AU - Trernikov, P. V.

AU - Emlin, D. R.

AU - Chukin, A. V.

AU - Surkov, Yu S.

PY - 2019/2/15

Y1 - 2019/2/15

KW - AlO coating

KW - Ion assistance

KW - Reactive thermal evaporation

KW - α-AlO

KW - HOLLOW-CATHODE

KW - ALPHA-AL2O3 COATINGS

KW - alpha-Al2O3

KW - PERFORMANCE

KW - LOW-TEMPERATURES

KW - VACUUM-ARC

KW - PLASMA

KW - ALUMINA COATINGS

KW - HARDNESS

KW - Al2O3 coating

KW - MAGNETRON SPUTTER-DEPOSITION

KW - MICROSTRUCTURE

UR - http://www.scopus.com/inward/record.url?scp=85058799383&partnerID=8YFLogxK

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000457662700014

U2 - 10.1016/j.surfcoat.2018.12.065

DO - 10.1016/j.surfcoat.2018.12.065

M3 - Article

AN - SCOPUS:85058799383

VL - 359

SP - 117

EP - 124

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

ER -

ID: 8541582