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Structural defects and electronic structure of N-ion implanted TiO2: Bulk versus thin film
Research output
:
Contribution to journal
›
Article
›
peer-review
Department of Physical Techniques and Devices for Quality Control
Department of Theoretical Physics and Applied Mathematics
Laboratory of Ion Beam and Plasma Technology for New Functional Materials and Coatings
Department of Electrophysics
Institute of Physics and Technology
Overview
Cite this
DOI
https://doi.org/10.1016/j.apsusc.2015.07.190
Final published version
D. A. Zatsepin
D. W. Boukhvalov
E. Z. Kurmaev
I. S. Zhidkov
N. V. Gavrilov
M. A. Korotin
S. S. Kim
Original language
English
Pages (from-to)
984-988
Number of pages
5
Journal
Applied Surface Science
Volume
355
DOIs
https://doi.org/10.1016/j.apsusc.2015.07.190
Publication status
Published -
15 Nov 2015
ASJC Scopus subject areas
Surfaces, Coatings and Films
WoS ResearchAreas Categories
Chemistry, Physical
Materials Science, Coatings & Films
Physics, Applied
Physics, Condensed Matter
Research areas
X-ray photoelectron spectroscopy, Ion implantation, Density functional calculations, DOPED TIO2, PHOTOELECTRON-SPECTROSCOPY, MOLECULAR NITROGEN, TITANIUM NITRIDE, APPROXIMATION
ID: 554466
