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Stability of boron-doped graphene/copper interface: DFT, XPS and OSEE studies
Research output
:
Contribution to journal
›
Article
›
peer-review
Department of Theoretical Physics and Applied Mathematics
Department of Electrophysics
Department of Physical Techniques and Devices for Quality Control
Department of Experimental Physics
Institute of Physics and Technology
Overview
Cite this
DOI
https://doi.org/10.1016/j.apsusc.2018.02.074
Final published version
D. W. Boukhvalov
I. S. Zhidkov
A. I. Kukharenko
A. I. Slesarev
A. F. Zatsepin
S. O. Cholakh
E. Z. Kurmaev
Original language
English
Pages (from-to)
978-983
Number of pages
6
Journal
Applied Surface Science
Volume
441
DOIs
https://doi.org/10.1016/j.apsusc.2018.02.074
Publication status
Published -
31 May 2018
Research areas
Boron, DFT, Doping, Graphene, Interface, XPS, HIGH-PERFORMANCE, ENERGY, CARBON, GRAPHITE, SHEETS, FUEL-CELL CATHODE, OXYGEN REDUCTION, NANORIBBONS, NITROGEN, SYSTEMS
WoS ResearchAreas Categories
Chemistry, Physical
Materials Science, Coatings & Films
Physics, Condensed Matter
Physics, Applied
ASJC Scopus subject areas
Surfaces, Coatings and Films
ID: 6509875