Development of alpha tracks measurement with thermal oven as an etching technique for SSNTDs

Original language	English
Pages (from-to)	2903-2908
Number of pages	6
Journal	Materials Today: Proceedings
Volume	44
DOIs	https://doi.org/10.1016/j.matpr.2020.12.232
Publication status	Published - 2021
Event	2021 International Conference on Materials and Technologies, Material TECH 2021 - Raipur, India Duration: 9 Jan 2021 → 10 Jan 2021

Chemical etching parameters, CR-39 detector, Etching technique, LR-115 detector, Oven, CR-39

ID: 21864569