FIELD: chemistry.
SUBSTANCE: invention relates to a method of obtaining a luminescent material - converter of vacuum ultraviolet radiation into the visible range radiation in the form of an amorphous silicon oxide SiOX film on a silicon substrate, intended for the creation of functional elements of photonic devices of a new generation, as well as for control of hard ultraviolet radiation in vacuum technological processes. The implantation of oxygen ions into the said film is performed with the following annealing at a temperature of 700-900°C for 0.5-1 hour in the dry nitrogen atmosphere. For the implantation used is a converter in the form of a 20-70 nm thick amorphous silicon oxide film, the implantation is carried out with the energy of ions, the value of which is determined by formula E=0.19·d-0.18, where E is the energy of ions, keV, d is the thickness of the amorphous silicon dioxide film, selected in the range from 20 to 70 nm, and with the fluence, determined by formula F=2.21·1015·(x-2)·d, where F is the fluence, cm-2, d is the thickness of the amorphous silicon dioxide film, selected in the range from 20 to 70 nm, x is the stoichiometric coefficient, representing a dimensionless value, selected in the range from 2.01 to 2.45.
EFFECT: increase of the intensity of the converter red radiation and provision of red luminescence are provided with the preservation of conversion of vacuum ultraviolet radiation into visible radiation.