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Longitudinal Magnetoresistance of Ta/Dy/Ta Nanostructures. / Naumova, L. I.; Bebenin, N. G.; Zavornitsyn, R. S. и др.
в: Physics of Metals and Metallography, Том 124, № 14, 01.12.2023, стр. 1768-1775.

Результаты исследований: Вклад в журнал › Статья › Рецензирование

Harvard

Naumova, LI, Bebenin, NG, Zavornitsyn, RS, Milyaev, MA, Maksimova, IK, Proglyado, VV & Ustinov, VV 2023, 'Longitudinal Magnetoresistance of Ta/Dy/Ta Nanostructures', Physics of Metals and Metallography, Том. 124, № 14, стр. 1768-1775. https://doi.org/10.1134/S0031918X2360241X

APA

Naumova, L. I., Bebenin, N. G., Zavornitsyn, R. S., Milyaev, M. A., Maksimova, I. K., Proglyado, V. V., & Ustinov, V. V. (2023). Longitudinal Magnetoresistance of Ta/Dy/Ta Nanostructures. Physics of Metals and Metallography, 124(14), 1768-1775. https://doi.org/10.1134/S0031918X2360241X

Vancouver

Naumova LI, Bebenin NG, Zavornitsyn RS, Milyaev MA, Maksimova IK, Proglyado VV и др. Longitudinal Magnetoresistance of Ta/Dy/Ta Nanostructures. Physics of Metals and Metallography. 2023 дек. 1;124(14):1768-1775. doi: 10.1134/S0031918X2360241X

Author

Naumova, L. I. ; Bebenin, N. G. ; Zavornitsyn, R. S. и др. / Longitudinal Magnetoresistance of Ta/Dy/Ta Nanostructures. в: Physics of Metals and Metallography. 2023 ; Том 124, № 14. стр. 1768-1775.

BibTeX

@article{322d0575c85d430880d187bbe4bff67c,
title = "Longitudinal Magnetoresistance of Ta/Dy/Ta Nanostructures",
abstract = "The Ta/Dy/Ta nanostructures are fabricated by high-vacuum magnetron sputtering. Resistance and longitudinal magnetoresistance are measured. It is shown that the observed the effect of magnetic field on resistance are due to the competition of two effects of different nature. The negative isotropic magnetoresistance in the dysprosium layer is due to the alignment of local magnetic moments in the direction of the applied magnetic field. The positive longitudinal magnetoresistance in tantalum layers is caused by a change in the conditions of scattering of electrons during the accumulation of electrons with opposite spins on opposite surfaces of the metal film with strong spin-orbit coupling.",
author = "Naumova, {L. I.} and Bebenin, {N. G.} and Zavornitsyn, {R. S.} and Milyaev, {M. A.} and Maksimova, {I. K.} and Proglyado, {V. V.} and Ustinov, {V. V.}",
note = "The work was carried out with the support of the project RSF no. 22-22-00220.",
year = "2023",
month = dec,
day = "1",
doi = "10.1134/S0031918X2360241X",
language = "English",
volume = "124",
pages = "1768--1775",
journal = "Physics of Metals and Metallography",
issn = "0031-918X",
publisher = "Maik Nauka-Interperiodica Publishing",
number = "14",

}

RIS

TY - JOUR

T1 - Longitudinal Magnetoresistance of Ta/Dy/Ta Nanostructures

AU - Naumova, L. I.

AU - Bebenin, N. G.

AU - Zavornitsyn, R. S.

AU - Milyaev, M. A.

AU - Maksimova, I. K.

AU - Proglyado, V. V.

AU - Ustinov, V. V.

N1 - The work was carried out with the support of the project RSF no. 22-22-00220.

PY - 2023/12/1

Y1 - 2023/12/1

N2 - The Ta/Dy/Ta nanostructures are fabricated by high-vacuum magnetron sputtering. Resistance and longitudinal magnetoresistance are measured. It is shown that the observed the effect of magnetic field on resistance are due to the competition of two effects of different nature. The negative isotropic magnetoresistance in the dysprosium layer is due to the alignment of local magnetic moments in the direction of the applied magnetic field. The positive longitudinal magnetoresistance in tantalum layers is caused by a change in the conditions of scattering of electrons during the accumulation of electrons with opposite spins on opposite surfaces of the metal film with strong spin-orbit coupling.

AB - The Ta/Dy/Ta nanostructures are fabricated by high-vacuum magnetron sputtering. Resistance and longitudinal magnetoresistance are measured. It is shown that the observed the effect of magnetic field on resistance are due to the competition of two effects of different nature. The negative isotropic magnetoresistance in the dysprosium layer is due to the alignment of local magnetic moments in the direction of the applied magnetic field. The positive longitudinal magnetoresistance in tantalum layers is caused by a change in the conditions of scattering of electrons during the accumulation of electrons with opposite spins on opposite surfaces of the metal film with strong spin-orbit coupling.

UR - http://www.scopus.com/inward/record.url?partnerID=8YFLogxK&scp=85184264324

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=001157751800018

U2 - 10.1134/S0031918X2360241X

DO - 10.1134/S0031918X2360241X

M3 - Article

VL - 124

SP - 1768

EP - 1775

JO - Physics of Metals and Metallography

JF - Physics of Metals and Metallography

SN - 0031-918X

IS - 14

ER -

ID: 53751625