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Computational modeling of electrolytic deposition of a single-layer silicon film on silver and graphite substrates. / Ivanichkina, Ksenia A.; Galashev, Alexander Y.; Isakov, Andrey V.
в: Applied Surface Science, Том 561, 149959, 30.09.2021.

Результаты исследований: Вклад в журнал › Статья › Рецензирование

Harvard

Ivanichkina, KA, Galashev, AY & Isakov, AV 2021, 'Computational modeling of electrolytic deposition of a single-layer silicon film on silver and graphite substrates', Applied Surface Science, Том. 561, 149959. https://doi.org/10.1016/j.apsusc.2021.149959

APA

Ivanichkina, K. A., Galashev, A. Y., & Isakov, A. V. (2021). Computational modeling of electrolytic deposition of a single-layer silicon film on silver and graphite substrates. Applied Surface Science, 561, [149959]. https://doi.org/10.1016/j.apsusc.2021.149959

Vancouver

Ivanichkina KA, Galashev AY, Isakov AV. Computational modeling of electrolytic deposition of a single-layer silicon film on silver and graphite substrates. Applied Surface Science. 2021 сент. 30;561:149959. doi: 10.1016/j.apsusc.2021.149959

Author

Ivanichkina, Ksenia A. ; Galashev, Alexander Y. ; Isakov, Andrey V. / Computational modeling of electrolytic deposition of a single-layer silicon film on silver and graphite substrates. в: Applied Surface Science. 2021 ; Том 561.

BibTeX

@article{f5d413d286f547c8a2fcb6db51a0d372,
title = "Computational modeling of electrolytic deposition of a single-layer silicon film on silver and graphite substrates",
keywords = "Molecular dynamics, Molten salts, Silicon films, Substrate, Surface diffusion, MOLECULAR-DYNAMICS, GRAPHENE, SIMULATION, SALT, WATER CLUSTERS, COMPUTER, REDUCTION, INTERATOMIC POTENTIALS, KF, ELECTRODEPOSITION",
author = "Ivanichkina, {Ksenia A.} and Galashev, {Alexander Y.} and Isakov, {Andrey V.}",
note = "Funding Information: This research did not receive any specific grant from funding agencies in the public, commercial, or not-for-profit sectors. Publisher Copyright: {\textcopyright} 2021 Elsevier B.V. Copyright: Copyright 2021 Elsevier B.V., All rights reserved.",
year = "2021",
month = sep,
day = "30",
doi = "10.1016/j.apsusc.2021.149959",
language = "English",
volume = "561",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier BV",

}

RIS

TY - JOUR

T1 - Computational modeling of electrolytic deposition of a single-layer silicon film on silver and graphite substrates

AU - Ivanichkina, Ksenia A.

AU - Galashev, Alexander Y.

AU - Isakov, Andrey V.

N1 - Funding Information: This research did not receive any specific grant from funding agencies in the public, commercial, or not-for-profit sectors. Publisher Copyright: © 2021 Elsevier B.V. Copyright: Copyright 2021 Elsevier B.V., All rights reserved.

PY - 2021/9/30

Y1 - 2021/9/30

KW - Molecular dynamics

KW - Molten salts

KW - Silicon films

KW - Substrate

KW - Surface diffusion

KW - MOLECULAR-DYNAMICS

KW - GRAPHENE

KW - SIMULATION

KW - SALT

KW - WATER CLUSTERS

KW - COMPUTER

KW - REDUCTION

KW - INTERATOMIC POTENTIALS

KW - KF

KW - ELECTRODEPOSITION

UR - http://www.scopus.com/inward/record.url?scp=85108057733&partnerID=8YFLogxK

UR - https://elibrary.ru/item.asp?id=46861703

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=000729593000003

U2 - 10.1016/j.apsusc.2021.149959

DO - 10.1016/j.apsusc.2021.149959

M3 - Article

AN - SCOPUS:85108057733

VL - 561

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

M1 - 149959

ER -

ID: 22097985