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Pleomorphic structural imperfections caused by pulsed Bi-implantation in the bulk and thin-film morphologies of TiO
2
Research output
:
Contribution to journal
›
Article
›
peer-review
Department of Physical Techniques and Devices for Quality Control
Department of Theoretical Physics and Applied Mathematics
Department of Experimental Physics
Department of Electrophysics
Institute of Physics and Technology
Overview
Cite this
DOI
https://doi.org/10.1016/j.apsusc.2016.04.045
Final published version
D. A. Zatsepin
D. W. Boukhvalov
E. Z. Kurmaev
N. V. Gavrilov
S. S. Kim
I. S. Zhidkov
Original language
English
Pages (from-to)
223-229
Number of pages
7
Journal
Applied Surface Science
Volume
379
DOIs
https://doi.org/10.1016/j.apsusc.2016.04.045
Publication status
Published -
30 Aug 2016
Research areas
Aggregation, Bismuth oxide, DFT, Ion implantation, Titanium dioxide
WoS ResearchAreas Categories
Chemistry, Physical
Materials Science, Coatings & Films
Physics, Applied
Physics, Condensed Matter
ASJC Scopus subject areas
Surfaces, Coatings and Films
ID: 797211