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Comparative studies of nanoscale columnar AlxGa1-xN/AlN heterostructures grown by plasma-assisted molecular-beam epitaxy on cSi, porSi/cSi and SiC/porSi/cSi substrates. / Seredin, P.; Goloshchapov, D.; Kurilo, N. А. et al.
In: Optical Materials, Vol. 145, 114451, 2023.

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Harvard

Seredin, P, Goloshchapov, D, Kurilo, NА, Radam, A, Kashkarov, V, Lenshin, A, Buylov, N, Nesterov, D, Mizerov, A, Kukushkin, S, Timoshnev, SN, Shubina, K & Sobolev, M 2023, 'Comparative studies of nanoscale columnar AlxGa1-xN/AlN heterostructures grown by plasma-assisted molecular-beam epitaxy on cSi, porSi/cSi and SiC/porSi/cSi substrates', Optical Materials, vol. 145, 114451. https://doi.org/10.1016/j.optmat.2023.114451

APA

Seredin, P., Goloshchapov, D., Kurilo, N. А., Radam, A., Kashkarov, V., Lenshin, A., Buylov, N., Nesterov, D., Mizerov, A., Kukushkin, S., Timoshnev, S. N., Shubina, K., & Sobolev, M. (2023). Comparative studies of nanoscale columnar AlxGa1-xN/AlN heterostructures grown by plasma-assisted molecular-beam epitaxy on cSi, porSi/cSi and SiC/porSi/cSi substrates. Optical Materials, 145, [114451]. https://doi.org/10.1016/j.optmat.2023.114451

Vancouver

Seredin P, Goloshchapov D, Kurilo NА, Radam A, Kashkarov V, Lenshin A et al. Comparative studies of nanoscale columnar AlxGa1-xN/AlN heterostructures grown by plasma-assisted molecular-beam epitaxy on cSi, porSi/cSi and SiC/porSi/cSi substrates. Optical Materials. 2023;145:114451. doi: 10.1016/j.optmat.2023.114451

Author

BibTeX

@article{b355133aa5fe4207aa51b053b2096064,
title = "Comparative studies of nanoscale columnar AlxGa1-xN/AlN heterostructures grown by plasma-assisted molecular-beam epitaxy on cSi, porSi/cSi and SiC/porSi/cSi substrates",
abstract = "Problems of the growth of nanoscale columnar AlxGa1-xN/AlN heterostructures on hybrid substrates involving porous silicon and silicon carbide layers by molecular beam epitaxy technique with plasma-activated nitrogen are discussed in this study. The epitaxial growth of nanoscale columnar AlxGa1-xN/AlN heterostructure is shown to be specified by the layer of silicon carbide, which is formed by atomic substitution technique, and a porous silicon sublayer predetermines the oriented growth of SiC. The performed complex of structural-spectroscopic analysis demonstrated that epitaxial growth of the nuclear AlN layer on all types of the substrates in N-enriched conditions resulted in the formation of AlxGa1-xN/AlN heterostructures with Ga-polar surface. At the same time it was found that the layer of ordered AlxGa1-xN alloy was formed only on the hybrid SiC/porSi/cSi substrate. The layer of AlxGa1-xN on the substrates of cSi and porSi/cSi is present in the state of disordered alloy with an excess content of gallium atoms. Nanocolumns of AlxGa1-xN/AlN grown on the hybrid SiC/porSi/cSi substrate have two types of preferential azimuthal orientation that affects not only their structural and optical properties but also the value of elastic deformation in the heterostructure nanoscale layers. For the first time, azimuthal dependence of intensity of E1(TO) and E2high photon modes was detected in the Raman spectra. The observed periodicity angle in micro-Raman scattering coincides with the characteristic swivel of nanoscale columns of AlxGa1-xN/AlN around c-axis according to the data of XRD pole figure measurements. Results obtained in our work show promising capabilities in the use of SiC/porSi/сSi substrates for integration of silicon technology and technology of synthesis of the nanoscale columnar AlxGa1-xN heterostructures by molecular-beam epitaxy with plasma-activated nitrogen. {\textcopyright} 2023 Elsevier B.V.",
author = "P. Seredin and D. Goloshchapov and Kurilo, {N. А.} and Ali Radam and V. Kashkarov and A. Lenshin and N. Buylov and D. Nesterov and A. Mizerov and S. Kukushkin and S.n. Timoshnev and K. Shubina and M. Sobolev",
note = "Текст о финансировании #1 The work was carried out under financial support of the grant of Russian Science Foundation 19-72-10007 . Текст о финансировании #2 Elaboration of the hybrid substrate formation was performed under support of the grant provided by Ministry of Science and Higher Education of Russian Federation (grant № FZGU-2023-0006 ). Synthesis of the samples by MBE PA, as well as the studies of heterostructures polarity was performed within the frames of execution of the State task № FSRM-2023-0006. Текст о финансировании #3 As for access to the scientific equipment and methodology of the studies this investigation was realized under support of Ministry of Science and Higher Education of Russian Federation according to the contract № 075-15-2021-1351 .",
year = "2023",
doi = "10.1016/j.optmat.2023.114451",
language = "English",
volume = "145",
journal = "Optical Materials",
issn = "0925-3467",
publisher = "Elsevier BV",

}

RIS

TY - JOUR

T1 - Comparative studies of nanoscale columnar AlxGa1-xN/AlN heterostructures grown by plasma-assisted molecular-beam epitaxy on cSi, porSi/cSi and SiC/porSi/cSi substrates

AU - Seredin, P.

AU - Goloshchapov, D.

AU - Kurilo, N. А.

AU - Radam, Ali

AU - Kashkarov, V.

AU - Lenshin, A.

AU - Buylov, N.

AU - Nesterov, D.

AU - Mizerov, A.

AU - Kukushkin, S.

AU - Timoshnev, S.n.

AU - Shubina, K.

AU - Sobolev, M.

N1 - Текст о финансировании #1 The work was carried out under financial support of the grant of Russian Science Foundation 19-72-10007 . Текст о финансировании #2 Elaboration of the hybrid substrate formation was performed under support of the grant provided by Ministry of Science and Higher Education of Russian Federation (grant № FZGU-2023-0006 ). Synthesis of the samples by MBE PA, as well as the studies of heterostructures polarity was performed within the frames of execution of the State task № FSRM-2023-0006. Текст о финансировании #3 As for access to the scientific equipment and methodology of the studies this investigation was realized under support of Ministry of Science and Higher Education of Russian Federation according to the contract № 075-15-2021-1351 .

PY - 2023

Y1 - 2023

N2 - Problems of the growth of nanoscale columnar AlxGa1-xN/AlN heterostructures on hybrid substrates involving porous silicon and silicon carbide layers by molecular beam epitaxy technique with plasma-activated nitrogen are discussed in this study. The epitaxial growth of nanoscale columnar AlxGa1-xN/AlN heterostructure is shown to be specified by the layer of silicon carbide, which is formed by atomic substitution technique, and a porous silicon sublayer predetermines the oriented growth of SiC. The performed complex of structural-spectroscopic analysis demonstrated that epitaxial growth of the nuclear AlN layer on all types of the substrates in N-enriched conditions resulted in the formation of AlxGa1-xN/AlN heterostructures with Ga-polar surface. At the same time it was found that the layer of ordered AlxGa1-xN alloy was formed only on the hybrid SiC/porSi/cSi substrate. The layer of AlxGa1-xN on the substrates of cSi and porSi/cSi is present in the state of disordered alloy with an excess content of gallium atoms. Nanocolumns of AlxGa1-xN/AlN grown on the hybrid SiC/porSi/cSi substrate have two types of preferential azimuthal orientation that affects not only their structural and optical properties but also the value of elastic deformation in the heterostructure nanoscale layers. For the first time, azimuthal dependence of intensity of E1(TO) and E2high photon modes was detected in the Raman spectra. The observed periodicity angle in micro-Raman scattering coincides with the characteristic swivel of nanoscale columns of AlxGa1-xN/AlN around c-axis according to the data of XRD pole figure measurements. Results obtained in our work show promising capabilities in the use of SiC/porSi/сSi substrates for integration of silicon technology and technology of synthesis of the nanoscale columnar AlxGa1-xN heterostructures by molecular-beam epitaxy with plasma-activated nitrogen. © 2023 Elsevier B.V.

AB - Problems of the growth of nanoscale columnar AlxGa1-xN/AlN heterostructures on hybrid substrates involving porous silicon and silicon carbide layers by molecular beam epitaxy technique with plasma-activated nitrogen are discussed in this study. The epitaxial growth of nanoscale columnar AlxGa1-xN/AlN heterostructure is shown to be specified by the layer of silicon carbide, which is formed by atomic substitution technique, and a porous silicon sublayer predetermines the oriented growth of SiC. The performed complex of structural-spectroscopic analysis demonstrated that epitaxial growth of the nuclear AlN layer on all types of the substrates in N-enriched conditions resulted in the formation of AlxGa1-xN/AlN heterostructures with Ga-polar surface. At the same time it was found that the layer of ordered AlxGa1-xN alloy was formed only on the hybrid SiC/porSi/cSi substrate. The layer of AlxGa1-xN on the substrates of cSi and porSi/cSi is present in the state of disordered alloy with an excess content of gallium atoms. Nanocolumns of AlxGa1-xN/AlN grown on the hybrid SiC/porSi/cSi substrate have two types of preferential azimuthal orientation that affects not only their structural and optical properties but also the value of elastic deformation in the heterostructure nanoscale layers. For the first time, azimuthal dependence of intensity of E1(TO) and E2high photon modes was detected in the Raman spectra. The observed periodicity angle in micro-Raman scattering coincides with the characteristic swivel of nanoscale columns of AlxGa1-xN/AlN around c-axis according to the data of XRD pole figure measurements. Results obtained in our work show promising capabilities in the use of SiC/porSi/сSi substrates for integration of silicon technology and technology of synthesis of the nanoscale columnar AlxGa1-xN heterostructures by molecular-beam epitaxy with plasma-activated nitrogen. © 2023 Elsevier B.V.

UR - http://www.scopus.com/inward/record.url?partnerID=8YFLogxK&scp=85174387387

UR - https://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=tsmetrics&SrcApp=tsm_test&DestApp=WOS_CPL&DestLinkType=FullRecord&KeyUT=001102953100001

U2 - 10.1016/j.optmat.2023.114451

DO - 10.1016/j.optmat.2023.114451

M3 - Article

VL - 145

JO - Optical Materials

JF - Optical Materials

SN - 0925-3467

M1 - 114451

ER -

ID: 46914770