Co/Cu/Co pseudo spin-valve system prepared by magnetron sputtering with different argon pressure

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	211-214
Number of pages	4
Journal	Key Engineering Materials
Volume	644
DOIs	https://doi.org/10.4028/www.scientific.net/KEM.644.211
Publication status	Published - 1 Jan 2015

Co films and multilayers, Coercive force, Magnetoresistance, Magnetron sputtering, Spin-valve

ID: 303880