A structural criterion for simulation of optimalion-stimulated plasma growth of chained carbon

Research output: Contribution to journal › Article › peer-review

Original language	English
Article number	2100135
Number of pages	5
Journal	Plasma Processes and Polymers
Volume	19
Issue number	1
DOIs	https://doi.org/10.1002/ppap.202100135
Publication status	Published - Jan 2022

carbyne, film growth, molecular dynamics, plasma deposition, silicon substrate, DEPOSITION, CHEMISTRY, REAXFF

ID: 29217037